Materials for advanced microlithography: polymers for 157 nm lithography and acid diffusion measurements

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dc.contributor.advisorWillson, C. G. (C. Grant), 1939-en
dc.creatorTran, Hoang Vien
dc.date.accessioned2008-08-28T21:42:27Zen
dc.date.accessioned2017-05-11T22:16:05Z
dc.date.available2008-08-28T21:42:27Zen
dc.date.available2017-05-11T22:16:05Z
dc.date.issued2002en
dc.descriptiontexten
dc.description.departmentChemistry and Biochemistryen
dc.description.departmentChemistryen
dc.format.mediumelectronicen
dc.identifierb57262093en
dc.identifier.oclc57070255en
dc.identifier.proqst3086720en
dc.identifier.urihttp://hdl.handle.net/2152/1001en
dc.language.isoengen
dc.rightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.en
dc.subject.lcshMicrolithography--Materialsen
dc.subject.lcshPolymersen
dc.titleMaterials for advanced microlithography: polymers for 157 nm lithography and acid diffusion measurementsen
dc.type.genreThesisen

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