Modeling for control of an etch process in semiconductor fabrication

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dc.creatorWu, Feng-shang
dc.date.accessioned2016-11-14T23:07:40Z
dc.date.available2011-02-18T22:27:32Z
dc.date.available2016-11-14T23:07:40Z
dc.date.issued1986-12
dc.degree.departmentChemical Engineeringen_US
dc.description.abstractNot available
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/2346/18249en_US
dc.language.isoeng
dc.publisherTexas Tech Universityen_US
dc.rights.availabilityUnrestricted.
dc.subjectSemiconductors -- Etching -- Mathematical modelsen_US
dc.subjectComputer simulationen_US
dc.subjectIntegrated circuits -- Very large scale integrationen_US
dc.titleModeling for control of an etch process in semiconductor fabrication
dc.typeThesis

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