Nonlinear optical characterization of Si/high-k dielectric interfaces

dc.contributor.advisorDowner, Michael Coffinen
dc.creatorCarriles Jaimes, Ramónen
dc.date.accessioned2008-08-28T22:47:05Zen
dc.date.available2008-08-28T22:47:05Zen
dc.date.issued2005en
dc.descriptiontexten
dc.description.abstractSum frequency generation between a Ti:Sapphire beam and white light continuum is performed to obtain spectral information from GaAs(001). The experimental difficulties are analyzed and possible solutions and extensions to the technique proposed. The phase of second harmonic generation (SHG) is measured using a frequency domain technique. Phase shifts in GaAs under azimuthal rotation are observed and explained. The phase of the surface second order susceptibility tensor elements of Si is measured. For the first time SHG phase from Si/SiO2 and Si/SiO2/Hf-silicate is measured with a temporal resolution better than one second. Si/SiO2/Hf(1−x)SixO2 stack structures are studied using rotational anisotropic, spectroscopic, and time dependent SHG. It is found that the signal is affected by Si content (x) and by annealing history of the samples. The results show that SHG is sensitive to the phase separation of the silicates bulk due to spinodal decomposition. A heuristic model based on Hf-O-Si polarizable units that explains the observed trends is presented.
dc.description.departmentPhysicsen
dc.format.mediumelectronicen
dc.identifierb61207846en
dc.identifier.oclc71315763en
dc.identifier.urihttp://hdl.handle.net/2152/2399en
dc.language.isoengen
dc.rightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.en
dc.subject.lcshSilicon--Optical propertiesen
dc.subject.lcshSecond harmonic generationen
dc.subject.lcshDielectricsen
dc.titleNonlinear optical characterization of Si/high-k dielectric interfacesen
dc.type.genreThesisen

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