An electron cyclotron resonance toroidal plasma system for thin film deposition
| dc.creator | Greig, Wendy Ellen | |
| dc.date.accessioned | 2016-11-14T23:20:13Z | |
| dc.date.available | 2011-02-18T21:16:28Z | |
| dc.date.available | 2016-11-14T23:20:13Z | |
| dc.date.issued | 1995-05 | |
| dc.degree.department | Physics | en_US |
| dc.description.abstract | A toroidal electron cyclotron resonance (TECR) plasma deposition system has been built and tested with an argon plasma. Design considerations for the TECR system will be discussed and improvements for future designs will be presented. Diagnostic techniques were used in the system for comparison with existing ECR and other plasma deposition systems. These diagnostics included a magnetic filed profile of the main deposition chamber and determination of plasma parameters, such as electron temperature, through the use of a Langmuir probe. The results of these diagnostics will be presented, as well as a discussion of the accuracy of a Langmuir probe in an ECR plasma. Finally, the plasma parameters will be linked to the TECR system's suitability for thin film growth. | |
| dc.format.mimetype | application/pdf | |
| dc.identifier.uri | http://hdl.handle.net/2346/15833 | en_US |
| dc.language.iso | eng | |
| dc.publisher | Texas Tech University | en_US |
| dc.rights.availability | Unrestricted. | |
| dc.subject | Plasma-enchanced chemical vapor deposition | en_US |
| dc.subject | Thin films | en_US |
| dc.subject | Plasma electrodynamics | en_US |
| dc.title | An electron cyclotron resonance toroidal plasma system for thin film deposition | |
| dc.type | Thesis |