Reactor start up and reaction kinetic models for a carbontetrafluoride plasma silicon dioxide semiconductor etch

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dc.creatorKeating, John Thomas
dc.date.accessioned2016-11-14T23:09:08Z
dc.date.available2011-02-18T23:28:24Z
dc.date.available2016-11-14T23:09:08Z
dc.date.issued1989-05
dc.degree.departmentChemical Engineeringen_US
dc.description.abstractNot available
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/2346/20039en_US
dc.language.isoeng
dc.publisherTexas Tech Universityen_US
dc.rights.availabilityUnrestricted.
dc.subjectSemiconductors -- Etchingen_US
dc.subjectPlasma etching -- Modelsen_US
dc.subjectGlow dischargesen_US
dc.subjectChemical reactorsen_US
dc.titleReactor start up and reaction kinetic models for a carbontetrafluoride plasma silicon dioxide semiconductor etch
dc.typeThesis

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