Superstructure conductivity in the digital micromirror device (DMDtm)

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dc.creatorWhitby, Amisha Mishay
dc.date.accessioned2016-11-14T23:16:01Z
dc.date.available2011-02-18T20:26:48Z
dc.date.available2016-11-14T23:16:01Z
dc.date.issued2004-12
dc.degree.departmentElectrical Engineeringen_US
dc.description.abstractThis paper investigates the distribution of conductivity in the DMD and how process anomalies can lead to a nonlinear response In addition, statistical methods will be used to prove that these process anomalies are present all wafers and all die. Finally, simulations based test data will be used to show how the impact of such nonlinearities affect the operating margin of the DMD.
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/2346/13857en_US
dc.language.isoeng
dc.publisherTexas Tech Universityen_US
dc.rights.availabilityUnrestricted.
dc.subjectMirrors -- Testingen_US
dc.subjectErroren_US
dc.subjectElectric conductivityen_US
dc.titleSuperstructure conductivity in the digital micromirror device (DMDtm)
dc.typeThesis

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