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Federated Electronic Theses and Dissertations
University of Texas at Austin
Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application
Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application
Date
2002-05
Authors
Gopalan, Sundararaman
Journal Title
Journal ISSN
Volume Title
Publisher
Abstract
Description
text
Keywords
Hafnium--Anaylsis
,
Hafnium--Thermal properties
,
Dielectric films
,
Thin films--Electric properties
Citation
URI
http://hdl.handle.net/2152/10984
Collections
University of Texas at Austin
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