Study of PECVD Films Containing Flourine and Carbon and Diamond Like Carbon Films for Ultra Low Dielectric Constant Interlayer Dielectric Applications

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dc.contributorLee, Gil Sik
dc.date.accessioned2017-01-04T21:43:43Z
dc.date.accessioned2018-02-16T18:48:29Z
dc.date.available2017-01-04T21:43:43Z
dc.date.available2018-02-16T18:48:29Z
dc.date.created2017-01-04T21:43:43Z
dc.date.issued2016-12
dc.description.abstract
dc.identifierhttp://hdl.handle.net/10735.1/5198
dc.identifier.urihttp://hdl.handle.net/10735.1/5198
dc.languageen
dc.subjectPECVD
dc.subjectPlasma-enhanced chemical vapor deposition
dc.subjectULK
dc.subjectDielectric films
dc.subjectIntegrated circuits
dc.subjectAmorphous substances
dc.subjectFluorocarbons
dc.titleStudy of PECVD Films Containing Flourine and Carbon and Diamond Like Carbon Films for Ultra Low Dielectric Constant Interlayer Dielectric Applications
dc.typeDissertation

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University of Texas at Dallas