Step and flash imprint lithography: materials and process development

dc.contributor.advisorWillson, C. G. (C. Grant), 1939-en
dc.creatorJohnson, Stephen Christopheren
dc.date.accessioned2008-08-28T22:07:23Zen
dc.date.accessioned2017-05-11T22:16:34Z
dc.date.available2008-08-28T22:07:23Zen
dc.date.available2017-05-11T22:16:34Z
dc.date.issued2005en
dc.descriptiontexten
dc.description.abstractStep and flash imprint lithography (SFIL) is a high resolution, low cost patterning technique developed at The University of Texas at Austin. Envisioned as an alternative to conventional photolithographic techniques currently used to pattern semiconductor substrates, SFIL utilizes photocurable monomers in a micromolding process to replicate features etched into a transparent template. The elimination of expensive projection optics and sources required for photolithography offers tremendous potential cost savings. This dissertation presents an overview of the SFIL process and provides a description of each process step. Particular attention is paid to development of SFIL compatible etch processes as well as to the effects of polymerization induced densification on feature profile. Modeling of polymerization induced feature shrinkage and simulation of line profiles during etch processing are also presented.
dc.description.departmentChemical Engineeringen
dc.format.mediumelectronicen
dc.identifierb59923283en
dc.identifier.oclc61387319en
dc.identifier.proqst3174479en
dc.identifier.urihttp://hdl.handle.net/2152/1582en
dc.language.isoengen
dc.rightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.en
dc.subject.lcshMicrolithography--Materialsen
dc.subject.lcshPolymersen
dc.subject.lcshMicrolithography--Texas--Austinen
dc.titleStep and flash imprint lithography: materials and process developmenten
dc.type.genreThesisen

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