Browsing by Subject "Computer-Aided Design"
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Item Analysing the Effects of Incentives and Model Attributes on CAD Model Creation and Alteration(2012-02-14) Diwakaran, Ram PrasadModern computer-aided design (CAD) systems have contributed significantly towards product development cycle time reduction and product quality improvement. To enhance the performance of CAD systems engineers must be able to create CAD models of conceptual designs quickly; at the same time CAD models must be easy to alter, so as to accommodate the rapid changes that the design undergoes through the lifecycle. However, there is no agreement in the way CAD models should be created to accomplish these goals. This work attempts to assess the effects of incentives on CAD model attributes during model creation and alteration; the effects of CAD model attributes on alteration are also investigated. Its aim is to derive prescriptions based on empirical evidence to improve CAD model creation and alteration efficiency. The CAD models under study are created by three sets of participants ? students from a junior level CAD course, students from a senior level CAD course and experienced engineers involved in product development activities. The participants are incentivized to create and alter CAD models of designs they are provided with. The results indicate that upon removal of incentives, engineers (both students and professionals) tend to compromise on proper modeling procedures. Experts are quicker and adhere to commonly agreed correct modeling procedures during CAD model creation and alteration than students. The results also indicate that it is beneficial for alteration to construct a model with several simple features as opposed to a few complex features and that these features be fully constrained. Maintaining the traditional feature sequence improves the perception of the model. The retention and alteration of features (as opposed to deletion) is also shown to be positively correlated with model perception ratings.Item CAD for nanolithography and nanophotonics(2011-08) Ding, Duo; Pan, David Z.; Chen, Ray T.; Ghosh, Joydeep; Orshansky, Michael E.; Torres, J. Andres; Touba, NurAs the semiconductor technology roadmap further extends, the development of next generation silicon systems becomes critically challenged. On the one hand, design and manufacturing closures become much more difficult due to the widening gap between the increasing integration density and the limited manufacturing capability. As a result, manufacturability issues become more and more critically challenged in the design of reliable silicon systems. On the other hand, the continuous scaling of feature size imposes critical issues on traditional interconnect materials (Cu/Low-K dielectrics) due to power, delay and bandwidth concerns. As a result, multiple classes of new materials are under research and development for future generation technologies. In this dissertation, we investigate several critical Computer-Aided Design (CAD) challenges under advanced nanolithography and nanophotonics technologies. In addressing these challenges, we propose systematic CAD methodologies and optimization techniques to assist the design of high-yield and high-performance integrated circuits (IC) with low power consumption. In Very Large Scale Integration (VLSI) CAD for nanolithography, we study the manufacturing variability under resolution enhancement techniques (RETs) and explore two important topics: (1) fast and high fidelity lithography hotspot detection; (2) generic and efficient manufacturability aware physical design. For the first topic, we propose a number of CAD optimization and integration techniques to achieve the following goals in detecting lithography hotspots: (a) high hotspot detection accuracy; (b) low false-positive rate (hotspot false-alarms); (c) good capability to trade-off between detection accuracy and false-alarms; (d) fast CPU run-time; and (e) excellent layout coverage and computation scalability as design gets more complex. For the second topic, we explore the routing stage by incorporating post-RET manufacturability models into the mathematical formulation of a detailed router to achieve: (a) significantly reduced lithography-unfriendly patterns; (b) small CPU run-time overhead; and (c) formulation generality and compatibility to all types of RETs and evoling manufacturing conditions. In VLSI CAD for nanophotonics, we focus on three topics: (1) characterization and evaluation of standard on-chip nanophotonics devices; (2) low power planar routing for on-chip opto-electrically interconnected systems; (3) power-efficient and thermal-reliable design of nanophotonics Wavelength Division Multiplexing for ultra-high bandwidth on-chip communication. With simulations and experiments, we demonstrate the critical role and effectiveness of Computer-Aided Design techniques as the semiconductor industry marches forward in the deeper sub-micron (45nm and below) domain.Item Developing a Model Three-Dimensional Animation of Embryonic Heart Development(2005-05-04) Carre, Ryan; Calver, LewisThree-dimensional animations are often effective in explaining complex phenomena, but altering the finished productions can be cumbersome and costly. The goal of this thesis was to develop a technique for easily altering 3D animations using 2D methods. In conjunction with the Olson Laboratory at the University of Texas Southwestern Medical Center, I created two animations dealing with heart development, based on one 3D animation model. The animations focused on cardiac morphogenesis and transcription factor expression. The purpose of this project was to not only visually communicate cardiac morphogenesis and the expression patterns of transcription factors, but to create a 3D model that can be used as a template for any further visualization of heart development research.