Unrestricted.2016-11-142011-02-182016-11-141999-05http://hdl.handle.net/2346/19987All-dielectric optical notch filters centered at 1.55 µm has been constructed, tested and analyzed. Optical notch filter design considerations such as choice of dielectric material pair, best structure of filters will be discussed. The actual optical notch filters show some absorption at 1.55 µm. Special single Si and Si02 layers have been deposited in the same deposition condition as that for the construction of optical notch filters. Material analysis including absorption analysis has been done to figure out why optical notch filters show absorption and where absorption come from.application/pdfengDielectric measurementsThin films -- Optical propertiesFabry-Perot interferometersDielectric devicesDielectric optical notch filter at 1.55 micrometersThesis