Reactor start up and reaction kinetic models for a carbontetrafluoride plasma silicon dioxide semiconductor etch

Date

1989-05

Authors

Journal Title

Journal ISSN

Volume Title

Publisher

Texas Tech University

Abstract

Not available

Description

Keywords

Semiconductors -- Etching, Plasma etching -- Models, Glow discharges, Chemical reactors

Citation

URI

http://hdl.handle.net/2346/20039

Collections

Texas Tech University