Design and analysis of precursors for CVD of Ru thin films and Li-ion batteries with MoP₄ anode materials

The chemical vapor deposition growth of amorphous metallic alloys is currently of interest for potential uses in electronic devices. We have explored the use of ligands having Ru-H, Ru-N, and Ru-P bonds to study the effects of ligand selection. The synthesis and design of novel Ru dinuclear complexes using volatile ligands such as 3,5-bis-trifluoromethylpyrazolate and trimethylphosphine will be presented as well as materials characterization studies on grown films. Another class of functional materials of interest is the transition metal phosphides (TMPs) which have found applications in Li-ion batteries. Current research on TMPs is focused on obtaining materials with improved or new compositions and morphologies and on improving Li insertion/de-insertion reactions and charge carrying capacities. Traditional routes to these materials involve the use of high temperatures and pressures. The work presented here will focus on a synthetic route which employs relatively mild conditions. Surface analysis studies and the electrochemical performance of mesoporous MoP₄ for use as anode materials in Li-ion batteries will be described.