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Silicon nanoparticle deposition on silicon dioxide and silicon nitride : techniques, mechanisms and models Leach, William Thomas (2002-05)This dissertation presents three studies discussing silicon nanoparticle deposition on two dielectric surfaces: silicon dioxode and silicon nitride. Attention is focused on growth of nanoparticles with a high areal density ...
Lim, Daeyoung (2001-08)
Sundareswaran, Savithri (2009-05)With aggressive technology scaling, within-die random variations are becoming the most dominant source of process variations. Gate-level statistical static timing is becoming a widely accepted approach as an alternative ...